The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2009

Filed:

Jun. 12, 2007
Applicants:

J. Gary Eden, Mahomet, IL (US);

Sung-jin Park, Champaign, IL (US);

Paul A. Tchertchian, Urbana, IL (US);

Seung Hoon Sung, Urbana, IL (US);

Inventors:

J. Gary Eden, Mahomet, IL (US);

Sung-Jin Park, Champaign, IL (US);

Paul A. Tchertchian, Urbana, IL (US);

Seung Hoon Sung, Urbana, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 17/49 (2006.01);
U.S. Cl.
CPC ...
Abstract

Microcavity plasma devices and arrays of microcavity plasma devices are provided that have a reduced excitation voltage. A trigger electrode disposed proximate to a microcavity reduce the excitation voltage required between first and second electrodes to ignite a plasma in the microcavity when gas(es) or vapor(s) (or combinations thereof) are contained within the microcavity. The invention also provides symmetrical microplasma devices and arrays of microcavity plasma devices for which current waveforms are the same for each half-cycle of the voltage driving waveform. Additionally, the invention also provides devices that have standoff portions and voids that can reduce cross talk. The devices are preferably also used with a trigger electrode.


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