The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2009
Filed:
Mar. 28, 2005
Benjamin P. Warner, Los Alamos, NM (US);
T. Mark Mccleskey, Los Alamos, NM (US);
Anthony K. Burrell, Los Alamos, NM (US);
Anoop Agrawal, Tucson, AZ (US);
Simon B. Hall, Palmerston North, NZ;
Benjamin P. Warner, Los Alamos, NM (US);
T. Mark McCleskey, Los Alamos, NM (US);
Anthony K. Burrell, Los Alamos, NM (US);
Anoop Agrawal, Tucson, AZ (US);
Simon B. Hall, Palmerston North, NZ;
Los Alamos National Security, LLC, Los Alamos, NM (US);
Abstract
Radiofrequency attenuator and method. The attenuator includes a pair of transparent windows. A chamber between the windows is filled with molten salt. Preferred molten salts include quarternary ammonium cations and fluorine-containing anions such as tetrafluoroborate (BF), hexafluorophosphate (PF), hexafluoroarsenate (AsF), trifluoromethylsulfonate (CFSO), bis(trifluoromethylsulfonyl)imide ((CFSO)N), bis(perfluoroethylsulfonyl)imide ((CFCFSO)N) and tris(trifluoromethylsulfonyl)methide ((CFSO)C). Radicals or radical cations may be added to or electrochemically generated in the molten salt to enhance the RF attenuation.