The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2009
Filed:
Sep. 15, 2006
Toshiya Kotani, Machida, JP;
Hirotaka Ichikawa, Yokohama, JP;
Toshiya Kotani, Machida, JP;
Hirotaka Ichikawa, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A pattern of a desired size is formed on a semiconductor substrate by the following procedure. A property, including at least one of an aberration of an exposure device, a property of an illumination, a property of a projection lens, and a pattern coverage in a shot, are allocated, in a first database, to predetermined positions assigned in a chip. A second database is prepared by pairing a cell name of a cell extracted from hierarchical processing of a design pattern and arrangement positional data of the cell. The property data is allocated to the cell based on the first and second databases. Mask data processing based on at least one of the property data is executed, and the cell subjected to the mask data processing is rearranged on the chip.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile