The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2009

Filed:

Jul. 02, 2007
Applicants:

Clarence Chui, San Jose, CA (US);

Denis Endisch, Cupertino, CA (US);

Lior Kogut, Haifa, IL;

Ming-hau Tung, San Francisco, CA (US);

Yeh-jiun Tung, Santa Clara, CA (US);

Chih-wei Chiang, Hsin-Chu, TW;

Inventors:

Clarence Chui, San Jose, CA (US);

Denis Endisch, Cupertino, CA (US);

Lior Kogut, Haifa, IL;

Ming-Hau Tung, San Francisco, CA (US);

Yeh-Jiun Tung, Santa Clara, CA (US);

Chih-Wei Chiang, Hsin-Chu, TW;

Assignee:

IDC, LLC, San Francisco, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A microelectromechanical (MEMS) device includes a first reflective layer, a movable element, and an actuation electrode. The movable element is over the first reflective layer. The movable element includes a deformable layer and a reflective element. The actuation electrode is between the deformable layer and the reflective element.


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