The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2009
Filed:
Jun. 26, 2006
Kazunori Tanimoto, Kizugawa, JP;
Tatsuji Saitoh, Kobe, JP;
Kazunori Tanimoto, Kizugawa, JP;
Tatsuji Saitoh, Kobe, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A parallax barrier is manufactured by forming a light-blocking layer by patterning a metal layer or a resin layer on a barrier glass in a photolithography step. On a mask used in the photolithography step, some pitches between slits are different, the slits corresponding to portions whereupon the light-blocking layers are to be formed. In addition, on the mask, first pitches (for instance, 100) and second pitches (for instance 99.5), which can be actually formed with accuracy, are formed in a cycle, and the average of such pitches can be accord with a theoretical pitch distance (for instance, 99.99). Thus, in the parallax barrier to be used for a multiple display device, visibility of the entire screen can be improved, and the parallax barrier which can be manufactured by using the mask lithography technology having a limited accuracy, and a method for manufacturing such parallax barrier are provided.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile