The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2009
Filed:
Feb. 17, 2006
Ching-wu Chu, Houston, TX (US);
Feng Chen, Houston, TX (US);
Yu-yi Xue, Houston, TX (US);
Jason Shulman, Houston, TX (US);
Stephen Tsui, Houston, TX (US);
Ching-Wu Chu, Houston, TX (US);
Feng Chen, Houston, TX (US);
Yu-Yi Xue, Houston, TX (US);
Jason Shulman, Houston, TX (US);
Stephen Tsui, Houston, TX (US);
University of Houston, Houston, TX (US);
Abstract
A negative dielectric is induced by the application of a dc bias-electric field in aggregates of oxide nano-particles whose surfaces have been specially treated. The magnitude of the dielectric constant and the frequency where the negative dielectric constant occurs can be adjusted. Such material systems have profound implications in novel devices as well as in science development, e.g. unusual wave propagation, secured communication and ultra-high temperature superconductivity.