The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2009
Filed:
Nov. 27, 2007
Applicants:
Jae-hwang Sim, Seoul, KR;
Yong-sik Yim, Seongnam-si, KR;
Ki-nam Kim, Seoul, KR;
Jae-kwan Park, Suwon-si, KR;
Inventors:
Jae-Hwang Sim, Seoul, KR;
Yong-Sik Yim, Seongnam-si, KR;
Ki-Nam Kim, Seoul, KR;
Jae-Kwan Park, Suwon-si, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/8247 (2006.01); H01L 21/8222 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a non-volatile memory device includes forming first mask patterns, which can have relatively large distances therebetween. A distance regulating layer is formed that conformally covers the first mask patterns. Second mask patterns are formed in grooves on the distance regulating layer between the first mask patterns.