The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2009
Filed:
Jan. 09, 2009
Seok-yoon Yang, Cheonan, KR;
Gil-lae Kim, Hwaseong-kun, KR;
Chan-seok Park, Hwaseong-kun, KR;
Choon-ho Park, Hwaseong-kun, KR;
Soo-guy Rho, Suwon, KR;
Seok-Yoon Yang, Cheonan, KR;
Gil-Lae Kim, Hwaseong-kun, KR;
Chan-Seok Park, Hwaseong-kun, KR;
Choon-Ho Park, Hwaseong-kun, KR;
Soo-Guy Rho, Suwon, KR;
Abstract
The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the-value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.