The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2009
Filed:
May. 16, 2006
Sylvain Coulombe, Notre-Dame-de-L'ile-Perrot, CA;
Sara Yonson, Ottawa, CA;
Valerie Leveille, Montreal, CA;
Richard Leask, Montreal, CA;
Sylvain Coulombe, Notre-Dame-de-L'ile-Perrot, CA;
Sara Yonson, Ottawa, CA;
Valerie Leveille, Montreal, CA;
Richard Leask, Montreal, CA;
McGill University, Montreal, CA;
Abstract
A low-power atmospheric pressure plasma source, comprising a plasma-forming region for injection of a plasma-forming gas; an excitation region for injection of a source of reactive species downstream of the plasma-forming region; and a narrow converging plasma exit for producing a narrow plasma jet, the source being electrically decoupled from a substrate under treatment by the plasma jet. The present source may find applications for example for skin treatment, etching of skin cancer cells, detachment of cells, removal of skin pigmentation and deposition of temporary organic films.