The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2009
Filed:
Jan. 31, 2007
Applicants:
Ryuzo Ueno, Nishinomiya, JP;
Kunikazu Asaka, Tokyo-to, JP;
Kazuyuki Hirao, Kyoto-fu, JP;
Shingo Kanehira, Higashiosaka, JP;
Masaya Kitayama, Takarazuka, JP;
Inventors:
Ryuzo Ueno, Nishinomiya, JP;
Kunikazu Asaka, Tokyo-to, JP;
Kazuyuki Hirao, Kyoto-fu, JP;
Shingo Kanehira, Higashiosaka, JP;
Masaya Kitayama, Takarazuka, JP;
Assignee:
LEF Technology, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 3/28 (2006.01); C08J 7/18 (2006.01); C09K 19/00 (2006.01); G02F 1/03 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of modifying liquid crystal polymers, which involves a step of irradiating a liquid crystal polymer with the laser beam having a pulse width of 10seconds or less. Using the invention method, the physical strength of the liquid crystal polymers can be improved as compared with the conventional liquid crystal polymers.