The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2009
Filed:
Mar. 12, 2007
Krishna G Sachdev, Hopewell Junction, NY (US);
Michael Berger, New Paltz, NY (US);
Gregg Monjeau, Wallkill, NY (US);
Robert A. Rita, Manlius, NY (US);
Kathleen M Wiley, Wappingers Falls, NY (US);
Krishna G Sachdev, Hopewell Junction, NY (US);
Michael Berger, New Paltz, NY (US);
Gregg Monjeau, Wallkill, NY (US);
Robert A. Rita, Manlius, NY (US);
Kathleen M Wiley, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method to repair ceramic substrates is disclosed using a novel polyimide polymer which has high thermal stability, resistance to fluxes and flux residue cleaning solvents and processes, good mechanical properties, good adhesion to all contacting surfaces with low moisture uptake and good flow properties suitable for repairing chipped ceramic, filling deep trench or vias and writing passivation lines with automated process The polyimide polymer is made by reacting aromatic dianhydride and aromatic diamine monomers with a stoichiometric offset and end capping the resulting polymer when the reaction is completed. The preferred polyimide is made using a molar excess of diamine which is end-capped using an anhydride.