The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2009
Filed:
Aug. 11, 2003
Andrew C. Perry, Oradell, NJ (US);
Holger J. Koenigsmann, Congers, NY (US);
David E. Dombrowski, Tuxedo Park, NY (US);
Thomas J. Hunt, Peekskill, NY (US);
Andrew C. Perry, Oradell, NJ (US);
Holger J. Koenigsmann, Congers, NY (US);
David E. Dombrowski, Tuxedo Park, NY (US);
Thomas J. Hunt, Peekskill, NY (US);
Praxair S.T. Technology, Inc., North Haven, CT (US);
Abstract
The method manufactures high-purity ferromagnetic sputter targets by cryogenic working the sputter target blank at a temperature below at least −50° C. to impart at least about 5 percent strain into the sputter target blank to increase PTF uniformity of the target blank. The sputter target blank is a nonferrous metal selected from the group consisting of cobalt and nickel; and the nonferrous metal has a purity of at least about 99.99 weight percent. Finally, fabricating the sputter target blank forms a sputter target having an improved PTF uniformity arising from the cryogenic working.