The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2009

Filed:

Sep. 13, 2005
Applicants:

Ryuhei Kametani, Osaka, JP;

Takashi Ohira, Chichibu, JP;

Susumu Muta, Chichibu, JP;

Inventors:

Ryuhei Kametani, Osaka, JP;

Takashi Ohira, Chichibu, JP;

Susumu Muta, Chichibu, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A63B 37/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided as ink for a golf ball for use in marking a golf ball is ink for a golf ball including an ink resin having a predetermined hydroxyl value and block isocyanate. When marking a golf ball by using the ink of the present invention, a hydroxyl group in the ink resin in an ink layer and an isocyanate group derived from the block isocyanate react with each other to increase hardness of the ink layer, thereby improving abrasion resistance of the marking. In addition, the isocyanate group derived from the block isocyanate and a functional group of an ionomer resin on the ball surface react with each other to improve adhesiveness of marking to the ball surface. Furthermore, the hydroxyl group of the ink resin and an isocyanate group in a urethane top coat layer react with each other to increase strength of the ink layer, thereby improving hitting resistance of the marking. Then, nitrogen in urethane bonding generated by the reaction between the hydroxyl group in the ink layer and the isocyanate group and the isocyanate group in the urethane top coat layer react with each other to further improve abrasion resistance of the marking.


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