The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2009

Filed:

Jan. 03, 2006
Applicants:

Vitaly Rozenman, Shrewsbury, MA (US);

Benjamin Bushoy, Needham, MA (US);

Evgeny Roytman, Sharon, MA (US);

Inventors:

Vitaly Rozenman, Shrewsbury, MA (US);

Benjamin Bushoy, Needham, MA (US);

Evgeny Roytman, Sharon, MA (US);

Assignee:

EMC Corporation, Hopkinton, MA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 7/00 (2006.01); G06F 17/00 (2006.01); G06F 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present disclosure is directed to a system, method, apparatus, encoded computer readable media, etc., for maintaining data. A processor function maintains a map that keeps track of which data information stored in a first repository have corresponding record information stored in a second repository. The map can be used to facilitate synchronization of the first repository and the second repository. For example, the processor function can receive a command to delete a particular managed object from the first repository. In response to receiving the command, the processor function utilizes the map to identify whether the particular managed object to be deleted from the first repository has any corresponding related records stored in the second repository. If so, the processor function provides a notification (to an information management application associated with the second repository) indicating that the corresponding related record stored in the second repository can be deleted.


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