The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Nov. 17, 2004
Woo-sup Han, Yongin-si, KR;
Kyung-shik Roh, Seongnam-si, KR;
Woong Kwon, Seongnam-si, KR;
Young-bo Shim, Seoul, KR;
Yeon-taek OH, Yongin-si, KR;
Ki-cheol Park, Taean-sub, KR;
Woo-Sup Han, Yongin-si, KR;
Kyung-shik Roh, Seongnam-si, KR;
Woong Kwon, Seongnam-si, KR;
Young-bo Shim, Seoul, KR;
Yeon-taek Oh, Yongin-si, KR;
Ki-cheol Park, Taean-sub, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A landmark detection apparatus and method, the apparatus including a first detection unit that generates N first sample blocks in a first sampling region using a first weighted sampling method according to a first degree of dispersion, and that performs a first landmark detection by comparing a feature of each first sample block a feature of a landmark model, where the first sample region is set to the entirety of a current frame image; and a second detection unit that generates N second sample blocks in a second sampling region using a second weighted sampling method according to a second degree of dispersion, and that performs a second landmark detection by comparing a feature of each second sample block the feature of the landmark model, where the second sampling region is set to an area less than the entirety of the current frame image.