The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Nov. 10, 2004
Karl R. Gust, Troy, MI (US);
Joseph P. Borst, Plymouth, MI (US);
Heinz P. Plaumann, Brownstown, MI (US);
Karl R. Gust, Troy, MI (US);
Joseph P. Borst, Plymouth, MI (US);
Heinz P. Plaumann, Brownstown, MI (US);
BASF Corporation, Florham Park, NJ (US);
Abstract
A method of reducing a content of a residual styrene monomer in a polyol utilizes a polyol, a peroxide, an adjustment of temperature, and an application of a vacuum to separate the residual styrene monomer from the polyol. The residual styrene monomer is classified as a volatile organic compound. The peroxide includes monoperoxycarbonates and peroxyketals. Peroxide radicals, present in the peroxide, react with and polymerize the residual styrene monomer to form a polymer having decreased volatility. Applying the vacuum physically separates the residual styrene monomer from the polyol by increasing a vapor pressure of the residual styrene monomer. Separating the residual styrene monomer from the polyol forms an improved polyol which includes less than 20 parts per million of the residual styrene monomer in the polyol.