The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
May. 09, 2007
Applicants:
Jeong-hoon Han, Gyeonggi-do, KR;
Jin-hyuk Yoo, Gyeonggi-do, KR;
Young-rok Kim, Daejeon, KR;
Inventors:
Assignee:
Jusung Engineering Co., Ltd., Gwangju-shi, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of filling a gap on a substrate comprises disposing the substrate, on which the gap is formed, on a susceptor in a chamber; applying a source power to the chamber to generate plasmas into the chamber; supplying a process gas into the chamber; filling a thin film into a gap by applying a first bias power to the susceptor, an amplitude of the first bias power being periodically modulated; stopping supply of the process gas and cutting off the first bias power; and extinguish the plasmas in the chamber.