The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Jan. 14, 2004
Takahiro Goto, Shizuoka-ken, JP;
Takahiro Goto, Shizuoka-ken, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
The present invention provides an image forming method comprising the steps of exposing imagewisely an image forming material having a photosensitive layer comprising an infrared absorbing agent, a polymerization initiator and a polymerizable compound on a substrate to overlapping infrared beams. The solubility of the photosensitive layer in an alkali developing solution reduces upon exposure to light of wavelengths in the range of 750 nm to 1400 nm. The exposed image forming material is developed, and the infrared beam diameter used in light exposure is 20 μm or less, and the overlapping coefficient is 0.8 or more.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile