The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Jan. 22, 2007
Applicants:
Sang-jun Choi, Seoul, KR;
Han-ku Cho, Seongnam-si, KR;
Inventors:
Sang-jun Choi, Seoul, KR;
Han-ku Cho, Seongnam-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03C 1/73 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the formula below: wherein Ris a C-Chydrocarbon group or a C-Chetero hydrocarbon group including at least one hetero atom selected from the group consisting of nitrogen, fluorine and sulfur.
Quick Actions:
Choi, Sang-jun. (2009). Photosensitive polymer and photoresist composition having the same (U.S. Patent No. 7604918). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7604918
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile