The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Dec. 13, 2006
Xing-cai Guo, Tracy, CA (US);
Dan S. Kercher, Santa Cruz, CA (US);
Bruno Marchon, Palo Alto, CA (US);
Charles M. Mate, San Jose, CA (US);
Tsai-wei Wu, San Jose, CA (US);
Xing-Cai Guo, Tracy, CA (US);
Dan S. Kercher, Santa Cruz, CA (US);
Bruno Marchon, Palo Alto, CA (US);
Charles M. Mate, San Jose, CA (US);
Tsai-Wei Wu, San Jose, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
Methods of performing nanoimprint lithography are described. For one method, a master tool and a stamper tool are formed to provide nanometer-scale imprinting. A release layer comprised of a perfluoropolyether diacrylate material is formed on the master tool and the stamper tool. The master tool and the stamper tool are used to form patterns in resist material, such as hole or pillar patterns. The resist material as described herein has lower viscosity and lower surface tension than prior resist materials allowing for more uniform replication of the patterns.