The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Jan. 22, 2007
Charles W. Dingell, Friendswood, TX (US);
Clemente E. Quintana, Houston, TX (US);
Suy Le, League City, TX (US);
Michael R. Clark, LaPorte, TX (US);
Robert E. Cloutier, Webster, TX (US);
David Scott Hafermalz, Houston, TX (US);
Charles W. Dingell, Friendswood, TX (US);
Clemente E. Quintana, Houston, TX (US);
Suy Le, League City, TX (US);
Michael R. Clark, LaPorte, TX (US);
Robert E. Cloutier, Webster, TX (US);
David Scott Hafermalz, Houston, TX (US);
Abstract
A sublimator includes a sublimation plate having a thermal element disposed adjacent to a feed water channel and a control point disposed between at least a portion of the thermal element and a large pore substrate. The control point includes a sintered metal material. A method of dissipating heat using a sublimator includes a sublimation plate having a thermal element and a control point. The thermal element is disposed adjacent to a feed water channel and the control point is disposed between at least a portion of the thermal element and a large pore substrate. The method includes controlling a flow rate of feed water to the large pore substrate at the control point and supplying heated coolant to the thermal element. Sublimation occurs in the large pore substrate and the controlling of the flow rate of feed water is independent of time. A sublimator includes a sublimation plate having a thermal element disposed adjacent to a feed water channel and a control point disposed between at least a portion of the thermal element and a large pore substrate. The control point restricts a flow rate of feed water from the feed water channel to the large pore substrate independent of time.