The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Jun. 19, 2003
Kenichi Hama, Kanagawa, JP;
Tsuyoshi Kage, Chiba, JP;
Takumi Kobayashi, Singapore, SG;
Takeharu Kawabe, Chiba, JP;
Kenichi Hama, Kanagawa, JP;
Tsuyoshi Kage, Chiba, JP;
Takumi Kobayashi, Singapore, SG;
Takeharu Kawabe, Chiba, JP;
Mitsubishi Shoji Plastics Corporation, Tokyo, JP;
Youtec Co., Ltd., Nagareyama-shi, JP;
Abstract
A rotary type CVD film forming apparatus for mass production, wherein a film forming chamber is formed by providing one columnar body having a plurality of housing spaces for housing one plastic container each in one said housing space, a plurality of said film forming chambers is arranged on a rotation support body at equal intervals in a circular state, source gas introduction means serving as an external electrode which introduce a source gas that is converted to plasma inside the plastic containers housed in each of said film forming chambers is provided, and high frequency supply means which supply a high frequency to the external electrode of each of said film forming chambers is provided to form a CVD (chemical vapor growing) film on the internal surfaces of said plastic containers.