The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2009
Filed:
Apr. 02, 2007
Noboru Yamaguchi, Tokyo, JP;
Noboru Yamaguchi, Tokyo, JP;
Hoya Corporation, Tokyo, JP;
Abstract
A defect inspection method is adapted to inspect a defect generated in a main pattern of a photomask. The main pattern includes a repetitive pattern in which unit patterns are periodically arranged. The method forms, an auxiliary pattern for inspection simultaneously with forming the main pattern. The auxiliary pattern includes a repetitive pattern having a period different from that of the main pattern. The method irradiates a light onto the auxiliary pattern at a predetermined incident angle and receives diffracted light generated by the auxiliary pattern by an observation apparatus to detect a defect of the auxiliary pattern, thereby determining the presence of a defect of the main pattern.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile