The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2009

Filed:

Jun. 16, 2006
Applicants:

Kuei-jung Chao, Hsinchu, TW;

Kuo-ying Huang, Taoyuan County, TW;

Shu Fang Chen, Taichung County, TW;

Inventors:

Kuei-jung Chao, Hsinchu, TW;

Kuo-ying Huang, Taoyuan County, TW;

Shu Fang Chen, Taichung County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01);
U.S. Cl.
CPC ...
Abstract

A nanoporous antireflection coating preparation method. A sol-gel precursor solution containing an organic template is coated onto a substrate. The sol-gel precursor solution containing the organic template is dried into a film. The organic template within the film is then removed to form a nanoporous antireflection coating. In preferred embodiments, the organic template is removed by UV—Otreatment at ambient temperature.


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Chao, Kuei-jung. (2009). Fabrication of nanoporous antireflection film (U.S. Patent No. 7598595). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7598595

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