The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2009

Filed:

Nov. 05, 2004
Applicants:

Koji Hotta, Aichi-ken, JP;

Sachiko Kawaji, Owariasahi, JP;

Masanori Usui, Seto, JP;

Takahide Sugiyama, Aichi-ken, JP;

Inventors:

Koji Hotta, Aichi-ken, JP;

Sachiko Kawaji, Owariasahi, JP;

Masanori Usui, Seto, JP;

Takahide Sugiyama, Aichi-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01); H01L 29/94 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a technique for accumulating minority carriers in the body region, that is, the intermediate region interposed between the top region and the deep region, and thus increasing the concentration of minority carriers in the intermediate region. A semiconductor device has a top region () of a second conductivity type, a deep region () of the second conductivity type, and an intermediate region () of a first conductivity type for isolating the top region and the deep region. The semiconductor device further has a trench gate () facing a portion of the intermediate region via an insulating layer (). The portion facing the trench gate isolates the top region and the deep region. The trench gate extends along a longitudinal direction. The width of the trench gate is not uniform along the longitudinal direction; instead the width of the trench gate varies along the longitudinal direction.


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