The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2009
Filed:
Jun. 11, 2003
Basab Chatterjee, Allen, TX (US);
Richard L. Guldi, Dallas, TX (US);
Keith W. Melcher, McKinney, TX (US);
Basab Chatterjee, Allen, TX (US);
Richard L. Guldi, Dallas, TX (US);
Keith W. Melcher, McKinney, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The present invention provides, in one embodiment, a method () of manufacturing a semiconductor device. A conventionally formed reticle is positioned over a resist located on a substrate (). A radiation path through the reticle and a window assembly located between a radiation source and resist (), is considered. It is determined whether or not the radiation would expose a predefined blocking area of the resist within the exposure zone (). If the radiation would expose a blocking area, then the window assembly is configured to prevent radiation from exposing the blocking area in the exposure zone (). Other embodiments include a window assembly () and system () to facilitate manufacturing of the semiconductor device according to the method ().