The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2009
Filed:
May. 18, 2007
Takeshi Hoshi, Yokohama, JP;
Masahiro Kiyotoshi, Sagamihara, JP;
Takeshi Hoshi, Yokohama, JP;
Masahiro Kiyotoshi, Sagamihara, JP;
Kabushki Kaisha Toshiba, Tokyo, JP;
Abstract
According to the present invention, there is provided a semiconductor device fabrication method having: coating a semiconductor substrate with a silazane perhydride polymer solution prepared by dispersing a silazane perhydride polymer in a solvent containing carbon, thereby forming a coating film; forming a polysilazane film by volatilizing the solvent by heat-treating the coating film; and inserting the semiconductor substrate into a predetermined furnace, lowering a pressure in the furnace, and oxidizing the polysilazane film while the pressure in the furnace is raised by supplying steam into the furnace, thereby forming a silicon oxide film.