The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2009

Filed:

Apr. 21, 2004
Applicants:

Yi-qun LI, Walnut Creek, CA (US);

Ning Wang, Martinez, CA (US);

Qizhen Xue, Walnut Creek, CA (US);

Shifan Cheng, Moraga, CA (US);

Xiao-dong Xiang, Danville, CA (US);

Inventors:

Yi-Qun Li, Walnut Creek, CA (US);

Ning Wang, Martinez, CA (US);

Qizhen Xue, Walnut Creek, CA (US);

Shifan Cheng, Moraga, CA (US);

Xiao-Dong Xiang, Danville, CA (US);

Assignee:

Intematix Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 1/03 (2006.01); C01F 11/00 (2006.01); C01F 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Novel metal oxide compositions are disclosed. These ferromagnetic or ferrimagnetic compositions have resitivities that vary between those of semiconducting and insulating materials, and they further exhibit Curie temperatures greater than room temperature (i.e., greater than 300 K). They are perovskite structures with the general chemical formulas (AM)BO, (AM)(B'B″)Oor A(BM)O, where A can be a 1, 2and 3charged ion; B can be a 5, 4, 3charged ion; B′ and B″ can be 2, 3, 4, 5and 6charged ion. M is a magnetic ion dopant. X-ray diffraction patterns are presented for exemplary compositions.


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