The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2009

Filed:

Apr. 01, 2004
Applicants:

Soon-il Ahn, Busan, KR;

Byoung-sun NA, Gyeonggi-do, KR;

Jeong-young Lee, Yongin-si, KR;

You-lee Song, Seoul, KR;

Inventors:

Soon-Il Ahn, Busan, KR;

Byoung-Sun Na, Gyeonggi-do, KR;

Jeong-Young Lee, Yongin-si, KR;

You-Lee Song, Seoul, KR;

Assignee:

Samsung Electronics, Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/12 (2006.01); G09G 3/36 (2006.01);
U.S. Cl.
CPC ...
Abstract

To improve product yield, light is scanned on a layer on a substrate through a mask. A pattern is formed on the substrate by the exposure of the layer. The direction of scanning is substantially perpendicular to a longitudinal direction of the pattern. The capacitance difference due to coupling of the pattern to be formed and a conductive layer formed through an insulation layer is reduced. Thus, failures of a display device are reduced and the product yield is increased.


Find Patent Forward Citations

Loading…