The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2009
Filed:
Mar. 08, 2005
Charles D. Iacovangelo, Clifton Park, NY (US);
Thomas Miebach, Ballston Spa, NY (US);
Michael W. Mercedes, Watervliet, NY (US);
Steven M. Gasworth, Farmington Hills, MI (US);
Michael R. Haag, Dearborn, MI (US);
Charles D. Iacovangelo, Clifton Park, NY (US);
Thomas Miebach, Ballston Spa, NY (US);
Michael W. Mercedes, Watervliet, NY (US);
Steven M. Gasworth, Farmington Hills, MI (US);
Michael R. Haag, Dearborn, MI (US);
Exatec, L.L.C., Wixom, MI (US);
Abstract
A system to coat a substrate includes a deposition chamber maintained at sub-atmospheric pressure, one or more arrays containing two or more expanding thermal plasma sources associated with the deposition chamber, and at least one injector containing orifices for each array. The substrate is positioned in the deposition chamber and each expanding thermal plasma source produces a plasma jet with a central axis, while the injector injects vaporized reagents into the plasma to form a coating that is deposited on the substrate. The injector orifices are located within a specified distance from the expanding thermal plasma source to obtain generally a coating with generally uniform coating properties.