The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2009

Filed:

Jul. 23, 2004
Applicants:

Mustapha Elyaakoubi, Ris-Orangis, FR;

Phannara Aing, Vitry-sur-Seine, FR;

Rainer Ostermann, Klaus, AT;

Klaus Neubeck, Sevelen, CH;

Benoit Riou, Bourg la Reine, FR;

Inventors:

Mustapha Elyaakoubi, Ris-Orangis, FR;

Phannara Aing, Vitry-sur-Seine, FR;

Rainer Ostermann, Klaus, AT;

Klaus Neubeck, Sevelen, CH;

Benoit Riou, Bourg la Reine, FR;

Assignee:

OC Oerlikon Balzers AG, Balzers, LI;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/02 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of manufacturing vacuum plasma treated workpieces includes the steps of introducing at least one workpiece to be treated into a vacuum chamber; treating the workpiece in the vacuum chamber, thereby establishing a plasma discharge in the vacuum chamber by a supply signal with maximum energy at a first frequency which is at least in the Hf frequency range; removing the workpiece treated from the vacuum chamber; performing a cleaning inside the vacuum chamber, thereby establishing the plasma discharge by a supply signal with maximum energy at a second frequency higher than the Hf frequency; and repeating these steps at least one time.


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