The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2009

Filed:

Dec. 29, 2006
Applicants:

Fan-tien Cheng, Tainan, TW;

Yeh-tung Chen, Kaohsiung Hsien, TW;

Yu-chuan Su, Tainan Hsien, TW;

Inventors:

Fan-Tien Cheng, Tainan, TW;

Yeh-Tung Chen, Kaohsiung Hsien, TW;

Yu-Chuan Su, Tainan Hsien, TW;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 15/00 (2006.01); G06F 15/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for evaluating reliance level of a virtual metrology system is disclosed. In this method, a reliance index (RI) and a RI threshold value are calculated by analyzing the process data of production equipment, thereby determining if the virtual metrology result is reliable. Besides, in this method, a global similarity index (GSI) and individual similarity indexes (ISI) are also provided for defining the degree of similarity between the current set of process data and all of the sets of historical process data used for establishing the conjecture model, thereby assisting the RI in gauging the degree of reliance and locating the key parameter(s) that cause major deviation.


Find Patent Forward Citations

Cheng, Fan-Tien. (2009). Method for evaluating reliance level of a virtual metrology system in product manufacturing (U.S. Patent No. 7593912). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7593912

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