The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2009
Filed:
Jul. 09, 2003
Masahiko Kubota, Tokyo, JP;
Yoshinori Tagawa, Kanagawa, JP;
Wataru Hiyama, Kanagawa, JP;
Tatsuya Masukawa, Kanagawa, JP;
Shoji Shiba, Kanagawa, JP;
Yoshiaki Kurihara, Kanagawa, JP;
Hiroe Ishikura, Kanagawa, JP;
Akihiko Okano, Kanagawa, JP;
Masahiko Kubota, Tokyo, JP;
Yoshinori Tagawa, Kanagawa, JP;
Wataru Hiyama, Kanagawa, JP;
Tatsuya Masukawa, Kanagawa, JP;
Shoji Shiba, Kanagawa, JP;
Yoshiaki Kurihara, Kanagawa, JP;
Hiroe Ishikura, Kanagawa, JP;
Akihiko Okano, Kanagawa, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
The invention is to provide a method for producing a fine structured member and a fine hollow structure, useful for producing a liquid discharge head which is inexpensive, precise and highly reliable, also to provide a method for producing a liquid discharge head utilizing such producing method for the fine structured member and the fine hollow structure and a liquid discharge head obtained by such producing method. A positive-working photosensitive material, including a ternary polymer containing an acrylate ester as a principal component, acrylic acid for thermal crosslinking and a monomer unit for expanding a sensitivity region, is used as a material for forming the Line structured member.