The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2009
Filed:
Oct. 13, 2006
Applicant:
Miyoko Kawashima, Tochigi-ken, JP;
Inventor:
Miyoko Kawashima, Tochigi-ken, JP;
Assignee:
Canon Kabushiki Kaisha, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure method includes the steps of illuminating a mask that has a contact hole pattern using an illumination light, and projecting, via a projection optical system, the contact hole pattern onto a substrate to be exposed, wherein three lights among diffracted lights from the contact hole pattern interfere with each other, wherein said mask is an attenuated phase shift mask, and wherein said illumination light forms a radial polarization illumination.
Kawashima, Miyoko. (2009). Exposure method (U.S. Patent No. 7592130). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7592130
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