The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2009
Filed:
Nov. 18, 2005
Applicants:
Tasuo Chiba, Hitachi, JP;
Tatsuya Ichikawa, Hitachi, JP;
Inventors:
Tasuo Chiba, Hitachi, JP;
Tatsuya Ichikawa, Hitachi, JP;
Assignee:
Hitachi Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 5/16 (2006.01); B32B 27/36 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract
There are disclosed a photosensitive element comprising a support film which comprises a biaxially oriented polyester film and a photosensitive resin composition layer formed on one surface of the polyester film; wherein a resin layer containing fine particles is formed on the opposite surface of the support film to which the photosensitive resin composition layer is formed, and said photosensitive resin composition comprises
Quick Actions:
Chiba, Tasuo. (2009). Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparation of wiring pattern and wiring pattern (U.S. Patent No. 7592124). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7592124
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