The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2009
Filed:
Mar. 04, 2007
Ming-shiann Shih, Taoyuan County, TW;
Heng-ju Lin, Tainan, TW;
Ching-sung Hsiao, Hsinchu, TW;
Ting-wei Huang, Hsinchu, TW;
Ming-Shiann Shih, Taoyuan County, TW;
Heng-Ju Lin, Tainan, TW;
Ching-Sung Hsiao, Hsinchu, TW;
Ting-Wei Huang, Hsinchu, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A plasma reformer includes a first electrode, a second electrode, an insulating member, an atomizing device and a power supply. A discharge gap is defined between the first electrode and the second electrode. The insulating member is arranged between the first electrode and the second electrode to insulating the first electrode and the second electrode, and a vortex gas flow route is formed between the insulating member and the first electrode, the second electrode. The second electrode penetrates the insulating member. The atomizing device is arranged on the first electrode and/or the second electrode. The power supply is connected with the first electrode and the second electrode.