The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
Jul. 10, 2007
Applicant:
Hyeung-yun Kim, Palo Alto, CA (US);
Inventor:
Hyeung-Yun Kim, Palo Alto, CA (US);
Assignee:
Advanced Structure Monitoring, Inc., Cupertino, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 11/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
Systems, methods and recordable media for identifying damage in a structure. A method includes the steps of: obtaining a plurality of damage index values for a network coupled to the structure, wherein each of the damage index values is a quantity to be affected by damage in the structure; generating a distribution of damage index value over a surface using the obtained damage index values; and identifying the damage by analyzing the distribution.
Kim, Hyeung-Yun. (2009). Systems and methods for identifying damage in a structure (U.S. Patent No. 7590510). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7590510
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile