The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
Jan. 16, 2008
Antonio Fincato, Cameri, IT;
Ubaldo Mastromatteo, Bareggio, IT;
Antonio Fincato, Cameri, IT;
Ubaldo Mastromatteo, Bareggio, IT;
STMicroelectronics S.R.L., Agrate Brianza (MI), IT;
Abstract
The invention relates to a process for manufacturing an integrated optical device comprising the deposition on a support substrate of a multilayer being formed by first and second cladding layers in order to hold in a multilayer first region a waveguide core layer. The core is provided with an electromagnetic radiation (L) inlet/outlet port. Furthermore, the process provides for the formation of a regulation layer having a first etching speed associated therewith, which is distinguished from the etching speeds of the cladding layers. Subsequently to an etching of a multilayer second region, a cavity is obtained having a first wall which is inclined relative to the substrate at least partially extending in said first region and which is near said inlet/outlet port. Such etching removes portions of the regulation layer and the cladding layers at different speeds in order to result in the formation of the inclined wall.