The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
May. 22, 2007
Chuan-cheng Cheng, Fremont, CA (US);
Shuhua Yu, Cupertino, CA (US);
Roawen Chen, San Jose, CA (US);
Albert Wu, Palo Alto, CA (US);
Chuan-Cheng Cheng, Fremont, CA (US);
Shuhua Yu, Cupertino, CA (US);
Roawen Chen, San Jose, CA (US);
Albert Wu, Palo Alto, CA (US);
Marvell International Ltd., Hamilton, BM;
Abstract
A structure configured to disconnect circuit elements. The structure generally includes a dielectric layer over a light-absorbing structure, and a lens over the dielectric layer and the light-absorbing structure, configured to at least partially focus light onto the light-absorbing structure. The light-absorbing structure absorbs a first wavelength of light with a minimum threshold efficiency, the lens is substantially opaque to the first wavelength of light, and the dielectric layer is substantially transparent to the first wavelength of light. The structure advantageously provides improved reliability and smaller chip area, thereby increasing the yield of the manufacturing process and the numbers of die per wafer (both gross and good).