The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
Jan. 07, 2007
Han-chung Lai, Hsinchu, TW;
Han-Chung Lai, Hsinchu, TW;
Au Optronics Corporation, Hsinchu, TW;
Abstract
A method of manufacturing a pixel structure controlled by a data line and a scan line is provided. A gate electrode electrically coupled to the scan line is formed on a substrate and a first dielectric layer covering the scan line and the gate electrode is formed. A first and a second semiconductor layer are formed on the dielectric layer and a source/drain and a patterned conductor layer are formed. A second dielectric layer is formed on the substrate to cover the data line, the resistance line and the source/drain. A first pixel electrode and a second pixel electrode are formed on the second dielectric layer and these two pixel electrodes are separated from each other; wherein the first pixel electrode is electrically connected to one of the source/drain while the second pixel electrode is electrically connected to another of the source/drain through the resistance wire.