The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
May. 11, 2006
Kentin L. Alford, Pasco, WA (US);
Kevin L. Simmons, Kennewick, WA (US);
William D. Samuels, Richland, WA (US);
Thomas S. Zemanian, Richland, WA (US);
Jun Liu, Albuquerque, NM (US);
Yongsoon Shin, Richland, WA (US);
Glen E. Fryxell, Kennewick, WA (US);
Kentin L. Alford, Pasco, WA (US);
Kevin L. Simmons, Kennewick, WA (US);
William D. Samuels, Richland, WA (US);
Thomas S. Zemanian, Richland, WA (US);
Jun Liu, Albuquerque, NM (US);
Yongsoon Shin, Richland, WA (US);
Glen E. Fryxell, Kennewick, WA (US);
Battelle Memorial Institute, Richland, WA (US);
Abstract
The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.