The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
Apr. 25, 2006
Hamid Balamane, Palo Alto, CA (US);
Christian Rene Bonhote, San Jose, CA (US);
Yimin Hsu, Sunnyvale, CA (US);
Aaron Neuhaus, San Jose, CA (US);
Aron Pentek, San Jose, CA (US);
Yi Zheng, San Ramon, CA (US);
Hamid Balamane, Palo Alto, CA (US);
Christian Rene Bonhote, San Jose, CA (US);
Yimin Hsu, Sunnyvale, CA (US);
Aaron Neuhaus, San Jose, CA (US);
Aron Pentek, San Jose, CA (US);
Yi Zheng, San Ramon, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A method for manufacturing a magnetic write head for perpendicular magnetic recording having a write pole with a very narrow track width and well controlled critical dimensions. The write pole is formed by depositing an electrically conductive seed layer over a substrate, and then depositing a photo resist layer over the seed layer. The photo resist layer is photolithographically exposed and developed to form an opening or trench in the photoreist layer, the opening defining the pattern of the write pole. A magnetic material is then plated into the opening in the photoresist layer. The photo resist layer can then be removed by a chemical lift off, and portions of the seed layer that are not covered by the write pole can be removed by ion milling.