The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2009

Filed:

Aug. 15, 2005
Applicants:

Peter Wiedemuth, Herbolzheim, DE;

Alfred Trusch, Brelsach, DE;

Dieter Meier, Brelsach, DE;

Gerhard Zaehringer, Freiburg, DE;

Inventors:

Peter Wiedemuth, Herbolzheim, DE;

Alfred Trusch, Brelsach, DE;

Dieter Meier, Brelsach, DE;

Gerhard Zaehringer, Freiburg, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H02J 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma process machine includes at least two electrodes disposed in a processing chamber and in contact with targets, an alternating current source connected to supply power to the electrodes, and a power delivery controller adapted to control power delivered by the alternating current source to the electrodes. The power delivery controller is configured to determine a control value from a comparison between actual power delivery as detected by a detector and a desired power delivery, and to adjust power delivery based on the control value.


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