The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2009
Filed:
Mar. 31, 2005
Kwok F. Lai, Palo Alto, CA (US);
Houchin Tang, Legal Representative, San Jose, CA (US);
Kang Song, San Jose, CA (US);
Douglas B. Hayden, San Jose, CA (US);
Kwok F. Lai, Palo Alto, CA (US);
Houchin Tang, legal representative, San Jose, CA (US);
Kang Song, San Jose, CA (US);
Douglas B. Hayden, San Jose, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
In one embodiment, a magnetron sputtering apparatus includes one or more magnet arrays for moving ions or charged particles on at least two plasma discharge paths on a target. Charged particles on one of the plasma discharge paths are moved in one direction, while charged particles on the other plasma discharge path are moved in the opposite direction to reduce rotational shifting of deposition flux on the patterned substrates. The plasma discharge paths may be formed by two symmetric magnet arrays or a single asymmetric magnet array rotated from behind the target.