The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2009
Filed:
Feb. 25, 2005
Jeffrey M. Catchmark, Bellefonte, PA (US);
Gregory S. Mccarty, State College, PA (US);
Anat Hatzor-de Picciotto, New Providence, NJ (US);
Guy P. Lavallee, State College, PA (US);
Michael A. Rogosky, Port Matilda, PA (US);
Jeffrey M. Catchmark, Bellefonte, PA (US);
Gregory S. McCarty, State College, PA (US);
Anat Hatzor-de Picciotto, New Providence, NJ (US);
Guy P. Lavallee, State College, PA (US);
Michael A. Rogosky, Port Matilda, PA (US);
The Penn State Research Foundation, University Park, PA (US);
Abstract
A multi-layer resist process is used to define a sacrificial host structure used to produce a molecular ruler useful for defining structures via a lift-off type process. By using this process, the removal of the host structure is significantly simplified, and a structure is formed which is perfect for achieving a reproducible high yield lift-off. Moreover, the processes disclosed are completely compatible with volume IC manufacturing processes, and uses a minimum of the organic material which, in a high volume production application, will dramatically reduce solution depletion.