The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2009
Filed:
Sep. 10, 2003
Katsuhiko Miya, Kyoto, JP;
Akira Izumi, Kyoto, JP;
Takashi Kawamura, Kyoto, JP;
Itsuki Kajino, Kyoto, JP;
Katsuhiko Miya, Kyoto, JP;
Akira Izumi, Kyoto, JP;
Takashi Kawamura, Kyoto, JP;
Itsuki Kajino, Kyoto, JP;
Abstract
A substrate (W) is held and rotated in its horizontal position on a spin base (). A processing liquid can be supplied from a processing liquid lower nozzleto the lower surface of the substrate (W). The upper surface of the substrate (W) is covered with an atmosphere blocking plate (). A splash guard () is disposed so as to circumscribe the substrate (W). A guard () is curved such that the vertical cross section of a recovery port () of the splash guard () is of substantially U-shape opening to the center of the splash guard (), so that the maximum internal diameter part of the recovery port () is brought near a guard (). The space between the internal wall surface of the recovery port () and the substrate (W) is increased to thereby suppress the bounce of the processing liquid flying spattering from the substrate (W) in rotation.