The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2009
Filed:
Aug. 17, 2004
Applicants:
Ruben Zadoyan, Irvine, CA (US);
Guy Vern Holland, San Clemente, CA (US);
Zolt Bor, San Clemente, CA (US);
Marcel Bouvier, Alisoviejo, CA (US);
Inventors:
Ruben Zadoyan, Irvine, CA (US);
Guy Vern Holland, San Clemente, CA (US);
Zolt Bor, San Clemente, CA (US);
Marcel Bouvier, Alisoviejo, CA (US);
Assignee:
AMO Development, LLC, Santa Ana, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 19/00 (2006.01); A61B 18/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides a method for minimizing fluence distribution of a laser over a predetermined pattern. In particular, the method is useful for minimizing fluence variance over a predetermined pattern for lasers used in ophthalmic surgery.
Zadoyan, Ruben. (2009). Apparatus and method for correction of aberrations in laser system optics (U.S. Patent No. 7584756). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7584756
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile