The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2009

Filed:

Oct. 05, 2004
Applicants:

Mark Gaug, Vestal, NY (US);

Richard D. Berbaum, Maine, NY (US);

Edward R. Bestle, Owego, NY (US);

Michael N. Blackwell, Binghamton, NY (US);

Inventors:

Mark Gaug, Vestal, NY (US);

Richard D. Berbaum, Maine, NY (US);

Edward R. Bestle, Owego, NY (US);

Michael N. Blackwell, Binghamton, NY (US);

Assignee:

Lockheed Martin Corporation, Bethesda, MD (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A graphical mark-up language authoring system using drag and drop placement of symbols representing mark-up language elements on a computer screen drawing and connecting the blocks by lines representing data and control flow to create a mark-up language sequence design. The symbols are instances of a mark-up language element that include the properties and attributes of that element. The system also includes a mark-up language view of the elements and their attributes and properties. The system permits effective authoring of mark-up language sequences by users not expert in mark-up language sequence design.


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