The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Nov. 17, 2004
Junichi Tanaka, Tokyo, JP;
Noboru Yamaguchi, Tokyo, JP;
Junichi Tanaka, Tokyo, JP;
Noboru Yamaguchi, Tokyo, JP;
Hoya Corporation, Tokyo, JP;
Abstract
It is possible to detect with high precision a plurality of types of nonuniformity defects that occur in patterns formed on the surface of an examination object. A device () for examination of nonuniformity defects that has a light source () for emitting light to a photomaskwhose surface is provided with a repeating pattern () in which unit patterns () are arrayed in a regular fashion, and a photodetector () for photodetecting and converting into photodetection data scattered light from the photomask, so that the photodetection data is observed to detect nonuniformity defects that have occurred in the repeating pattern, in the device further having a wavelength filter () for selecting and extracting one or a plurality of desired wavelength bands from the light of a plurality of wavelength bands, wherein nonuniformity defects of the repeating pattern are detected using the selected and extracted light of the wavelength band.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile