The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Jan. 12, 2007
Geoffrey Ryding, Manchester, MA (US);
Takao Sakase, Rowley, MA (US);
Marvin Farley, Ipswich, MA (US);
Theodore H. Smick, Essex, MA (US);
Geoffrey Ryding, Manchester, MA (US);
Takao Sakase, Rowley, MA (US);
Marvin Farley, Ipswich, MA (US);
Theodore H. Smick, Essex, MA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
This invention relates to a method of scanning a substrate through an ion beam in an ion implanter to provide uniform dosing of the substrate. The method comprises causing relative motion between the substrate and the ion beam such that the ion beam passes over all of the substrate and rotating the substrate substantially about its centre while causing the relative motion. Rotating the substrate while causing the relative motion between the substrate and the ion beam has several advantages including avoiding problematic angular effects, increasing uniformity, increasing throughput and allowing a greater range of ion beam profiles to be tolerated.